Intel Says FinFET-based Embedded MRAM is Production Ready
By Dylan McGrath, EETimes
February 20, 2019
SAN FRANCISCO — Intel gave further details on its technique for embedding spin-transfer torque (STT)-MRAM into devices using its 22nm FinFET process, pronouncing the technology ready for high-volume manufacturing. Embedded MRAM is considered a promising technology for applications such as internet-of-things (IoT) devices.
In a paper presented at the International Solid State Circuits Conference here Tuesday, Intel said it has used a "write-verify-write" scheme and a two-stage current sensing technique to create 7Mb perpendicular STT-MRAM arrays in its 22FFL FinFET process. The company had provided early details of its success in developing the first FinFET-based MRAM devices last year at the International Electron Devices Meeting.
To read the full article, click here
Related Semiconductor IP
- USB 20Gbps Device Controller
- SM4 Cipher Engine
- Ultra-High-Speed Time-Interleaved 7-bit 64GSPS ADC on 3nm
- Fault Tolerant DDR2/DDR3/DDR4 Memory controller
- 25MHz to 4.0GHz Fractional-N RC PLL Synthesizer on TSMC 3nm N3P
Related News
- NXP and TSMC to Deliver Industry's First Automotive 16 nm FinFET Embedded MRAM
- Renesas Develops Embedded MRAM Macro that Achieves over 200MHz Fast Random-Read Access and a 10.4 MB/s Fast Write Throughput for High Performance MCUs
- Cypress forms alliance and invests in MRAM IP developer NVE
- Toshiba and NEC Develop Key Technologies for High-Density MRAM
Latest News
- Arteris Selected by NanoXplore for Space Applications
- Siemens accelerates complex semiconductor design and test with Tessent IJTAG Pro
- Thalia and X-FAB Forge Strategic Partnership to Safeguard Supply and Accelerate IP Migration
- Morse Micro Secures $88 Million AUD Series C Funding to Lead the Next Era of IoT
- Altera Appoints Sandeep Nayyar as Chief Financial Officer