Dolphin Integration announces a new stem of Standard Cells for extremely low leakage in TSMC 90LP
January 25, 2007 -- The rising demand for battery-powered devices requires Integrated Circuits with minimal leakage current in sleep mode. Starting from 130 nm, the leakage current becomes very significant and increases exponentially at 90 nm and beyond, taking an increasing share of the overall power consumption of a System-on-Chip. Minimizing the leakage current thus is crucial, which ususally comes at the expense of integration density: The “SESAME eLLvHD” library of Standard Cells is optimized for extremely low leakage, while preserving high density: it enables to divide the leakage power by 100.
In addition SESAME eLLvHD has all the RCSL advantages, as a reduced Cell Set Library, providing the optimal solution for Medical applications, RFID, Smart Cards, Portable multimedia and Wireless applications.
Already available at TSMC 90LP and readily ported to other technological processes, SESAME eLLvHD benefits from a unique “Try and Buy tutorial” for guiding your evaluation, not only for free, but for fun.
More information on www.dolphin-ip.com
In addition SESAME eLLvHD has all the RCSL advantages, as a reduced Cell Set Library, providing the optimal solution for Medical applications, RFID, Smart Cards, Portable multimedia and Wireless applications.
Already available at TSMC 90LP and readily ported to other technological processes, SESAME eLLvHD benefits from a unique “Try and Buy tutorial” for guiding your evaluation, not only for free, but for fun.
More information on www.dolphin-ip.com
Related Semiconductor IP
- Multi-channel Ultra Ethernet TSS Transform Engine
- Configurable CPU tailored precisely to your needs
- Ultra high-performance low-power ADC
- HiFi iQ DSP
- CXL 4 Verification IP
Related News
- Dolphin Integration completes their catalog of Standard Cell Libraries with a new stem optimized for low leakage: LL-BTF
- Standard Cells reducing leakage 40 to 60 times at 90 and 65 nm from Dolphin Integration
- Leakage divided by more than 250 at 180 nm eLL with Dolphin Integration Panoply of memory and standard cells
- TSMC's Extremely Low Leakage Devices on 180nm eLL process empowers Dolphin Integration's IP offering
Latest News
- Embedded FPGA reaches a new stage of industrial maturity – Menta at Embedded World 2026
- Fraunhofer IPMS collaborates with Korean TSN Lab to further develop IP solutions for automotive and industrial connectivity
- Via Licensing Alliance Announces Longcheer and Desay SV as New Licensees to its Qi Wireless Power Patent Pool
- ASICLAND Signs New Contract with Global Neuromorphic AI Leader BrainChip
- Axelera AI Secures More Than $250 Million Funding on Global Commercial Growth