Samsung Describes 10nm SRAM
Area-optimized design shows 38% shrink
Rick Merritt, EETimes
2/4/2016 08:00 AM EST
SAN FRANCISCO – Samsung gave a peek at its 10nm finFET technology and an advanced 128 Mbit SRAM made in the process in a paper at the International Solid-State Circuits Conference (ISSCC) here.
A version of the new 6T SRAM bitcell optimized for size is 38% smaller than a similar part in Samsung’s 14nm process. It measures 0.040mm2 compared to 0.049mm2 for a version optimized for high current.
SRAMs take up as much as 30% of mobile applications processors and smaller size is generally a welcome indication of lower cost per transistor, Samsung noted. However in the case of the 10nm SRAM, small size created a problem.
To read the full article, click here
Related Semiconductor IP
- Samsung 8LPU 1.8V/3.3V SD/eMMC PHY AP1
- Samsung 5LPE 1.8V/3.3V SD/eMMC PHY AP2
- Low Power All Digital Fractional-N PLL in Samsung 14LPP
- Low Power All Digital Fractional-N PLL in Samsung 8LPP
- 50 mA LDO voltage regulator (output voltage 0.9V/1.2V/1.34V) on Samsung 65nm
Related News
- MoSys adds soft-error protection, correction to 1-transistor SRAM for 'free'
- MoSys SRAM sports symmetric pipeline
- UMC to port MoSys' one-transistor SRAM cell to advanced logic processes
- Embedded SRAM test and repair moves on-chip
Latest News
- Syntacore's SCR RISC-V IP Now Supports Zephyr 4.3
- Xylon Presents New 12-Channel GMSL3/GMSL2 FMC+ ExpansionBoard
- YMTC’s NAND Design Surprise Alongside a New Fab
- Lattice Collaborates with TI to Accelerate Edge AI for Robotics and Industrial Applications
- Alchip Appoints Freddy Engineer Chief Business Officer and North America General Manager