Mosis offers IBM 90-nm process on MPW
Peter Clarke, EE Times
(05/09/2006 3:13 PM EDT)
MUNICH, Germany
(05/09/2006 3:13 PM EDT)
MUNICH, Germany
— The Mosis integrated circuit fabrication service has begun offering multi-project wafer (MPW) runs on 90-nanometer process technologies from IBM, according to Paul Double, managing director of EDA Solutions Ltd.
EDA Solutions (Southampton, England) is the representative of Mosis in Europe.
The process is the 9SF process, which comes in three variants, low power digital, standard digital and analog and RF, said Double. The first customer submission deadline is Dec. 4, 2006, according to the Mosis website.
To read the full article, click here
Related Semiconductor IP
- Multi-channel, multi-rate Ethernet aggregator - 10G to 400G AX (e.g., AI)
- Multi-channel, multi-rate Ethernet aggregator - 10G to 800G DX
- 200G/400G/800G Ethernet PCS/FEC
- 50G/100G MAC/PCS/FEC
- 25G/10G/SGMII/ 1000BASE-X PCS and MAC
Related News
- Dolphin Integration first to achieve 0.84 pA per bit in SpRAM at the 90 nm uLL embedded flash process
- Dolphin Integration announces the availability of the new generation of SpRAM generator at 90 nm and 55 nm eFlash
- Mikron Licenses Cadence Physical Verification System and QRC Extraction Solutions for 90 nm IC Design Flow
- Dolphin Integration announce the availability of the TSMC sponsored sROMet and DpRAM generators at 90 nm LP eFlash
Latest News
- How CXL 3.1 and PCIe 6.2 are Redefining Compute Efficiency
- Secure-IC at Computex 2025: Enabling Trust in AI, Chiplets, and Quantum-Ready Systems
- Automotive Industry Charts New Course with RISC-V
- Xiphera Partners with Siemens Cre8Ventures to Strengthen Automotive Security and Support EU Chips Act Sovereignty Goals
- NY CREATES and Fraunhofer Institute Announce Joint Development Agreement to Advance Memory Devices at the 300mm Wafer Scale