Mosis offers IBM 90-nm process on MPW
Peter Clarke, EE Times
(05/09/2006 3:13 PM EDT)
MUNICH, Germany
(05/09/2006 3:13 PM EDT)
MUNICH, Germany
â The Mosis integrated circuit fabrication service has begun offering multi-project wafer (MPW) runs on 90-nanometer process technologies from IBM, according to Paul Double, managing director of EDA Solutions Ltd.
EDA Solutions (Southampton, England) is the representative of Mosis in Europe.
The process is the 9SF process, which comes in three variants, low power digital, standard digital and analog and RF, said Double. The first customer submission deadline is Dec. 4, 2006, according to the Mosis website.
To read the full article, click here
Related Semiconductor IP
- JPEG XL Encoder
- LPDDR6/5X/5 PHY V2 - Intel 18A-P
- ML-KEM Key Encapsulation & ML-DSA Digital Signature Engine
- MIPI SoundWire I3S Peripheral IP
- ML-DSA Digital Signature Engine
Related News
- Dolphin Integration first to achieve 0.84 pA per bit in SpRAM at the 90 nm uLL embedded flash process
- Dolphin Integration announces the availability of the new generation of SpRAM generator at 90 nm and 55 nm eFlash
- Mikron Licenses Cadence Physical Verification System and QRC Extraction Solutions for 90 nm IC Design Flow
- Dolphin Integration announce the availability of the TSMC sponsored sROMet and DpRAM generators at 90 nm LP eFlash
Latest News
- Are Synopsys Layoffs a Harbinger of the AI-Assisted Design Era?
- EnSilica to develop quantum-resilient secure processor chip for critical national infrastructure applications backed by £5m UK Government ‘Contract for Innovation’
- CAST Introduces JPEG XL Encoder IP Core for High- Quality, On-Camera Still-Image Compression
- PGC Strengthens Cloud and AI ASIC Acceleration with Synopsys’ Next-Generation Interface and Memory IP on Advanced Nodes
- IntelPro Licenses Ceva Wi-Fi 6 and Bluetooth 5 IPs to Launch AIoT Matter-Ready SoCs