Moore's Law Could Ride EUV for 10 More Years
By Alan Patterson, EETimes (September 30, 2021)
ASML plans to introduce new extreme ultraviolet (EUV) lithography equipment that will extend the longevity of Moore’s Law for at least ten years, according to executives at the world’s only supplier of the tools, which are crucial for the world’s most advanced silicon.
Starting in the first half of 2023, the company plans to offer customers equipment that takes EUV numerical aperture (NA) higher to 0.55 NA from the existing 0.33 NA. The company believes that the new equipment will help chip makers reach process nodes well beyond the current threshold (2nm) for at least another 10 years, according to ASML vice president Teun van Gogh, in an interview with EE Times.
“What we typically do is we try to make a tool available that can support our customers in a sort of two-year cadence,” van Gogh said. “When we start shipping high NA, which will be at the end of 2023, we will also have a two-year cadence there to support our customers. We believe that the technology that we offer will bring us well into the next decade to support our customers.”
Related Semiconductor IP
- AES GCM IP Core
- High Speed Ethernet Quad 10G to 100G PCS
- High Speed Ethernet Gen-2 Quad 100G PCS IP
- High Speed Ethernet 4/2/1-Lane 100G PCS
- High Speed Ethernet 2/4/8-Lane 200G/400G PCS
Related News
- Moore Microprocessor Portfolio (MMP) Inventor Files Lawsuit against TPL Group
- Moore's Law could enter the fourth dimension--via the third
- Moore's Law threatened by lithography woes
- Broadcom: Time to prepare for the end of Moore's Law
Latest News
- HPC customer engages Sondrel for high end chip design
- PCI-SIG’s Al Yanes on PCIe 7.0, HPC, and the Future of Interconnects
- Ubitium Debuts First Universal RISC-V Processor to Enable AI at No Additional Cost, as It Raises $3.7M
- Cadence Unveils Arm-Based System Chiplet
- Frontgrade Gaisler Unveils GR716B, a New Standard in Space-Grade Microcontrollers