Moore's Law threatened by lithography woes
Rick Merritt, EETimes
10/5/2012 9:26 AM EDT
LEUVEN, Belgium – Moore's Law, the engine of semiconductor innovation for decades, is losing steam due to delayed introduction of next-generation extreme ultraviolet lithography. That was the verdict of experts at the 2012 International Symposium on Extreme Ultraviolet Lithography.
EUV systems need light sources that are nearly 20 times more powerful than the ones used today to lay down patterns on next-generation chips that target sizes as small as 14 nm, Following a global symposium on the topic here, a group of lithography experts said that they hope to have the 200W EUV light sources by 2014—but it may take more time.
To read the full article, click here
Related Semiconductor IP
- NPU IP Core for Mobile
- NPU IP Core for Edge
- Specialized Video Processing NPU IP
- HYPERBUS™ Memory Controller
- AV1 Video Encoder IP
Related News
- Moore's Law could enter the fourth dimension--via the third
- Broadcom: Time to prepare for the end of Moore's Law
- Is Moore's Law Dead? Does It Matter?
- Moore's Law Dead by 2022, Expert Says
Latest News
- Jim Keller: ‘Whatever Nvidia Does, We’ll Do The Opposite’
- FlexGen Streamlines NoC Design as AI Demands Grow
- IntoPIX Presents Its New Titanium Software Suite: Empowering AV-Over-IP Workflows With Speed, Quality & Interoperability
- Global Semiconductor Sales Increase 2.5% Month-to-Month in April
- Speedata Raises $44M to Launch First-Ever Chip Designed Specifically for Accelerating Big Data Analytics - Compute's Second Largest Workload