Wirebond I/O Library in TSMC 130nm

Overview

A radiation-hardened TSMC 130nm Wirebond I/O Library with 3.3V GPIO, 3.3V LVDS TX & RX, 3.3V I2C ODIO, 3.3V Analog cell, OTP cell, and associated ESD.

Key attributes of this silicon-proven, radiation hardened I/O library include an extended operational temperature range (-50C to 200C), a sleep retention mode, and a built in power regulation PMOS device for core VDD. The GPIO cell can be configured as input, output or open drain with an optional internal 60K ohm pull up or pull down resistor and a selectable Schmitt trigger. Cells for IO core power and ground with built in ESD are included. 3.3V LVDS transmit receive cells, along with 3.3V programming, 3.3V I2C/SMBUS open drain and analog cells (and associated ESD) complement the GPIO offering. The library is enriched with feed through, filler, corner and domain break cells to allow for flexible pad ring construction. ESD design levels are 2KV HBM and 500V CDM.

Operating Conditions  GPIO Block Diagram

Parameter Value
VDDIO 3.3V
Core VDD 1.5V
BEOL 1P8M_6x1z
Temperature -50C to 200C
Cell Size 140um x 235um
Pitch 140um single
ESD 2kV HBM & 500V CDM

Cell Summary  

Cell Type Feature
Supply/ESD 3.3V; 1.5V; GND
GPIO 50MHz (15pF)
I2C ODIO 3.3V
LVDS 3.3V TX & RX
Analog 3.3V
OTP 3.3V
Break Cells VDDIO, VDD
Filler Cells 1um, 5um digital & analog

Key Features

  • Extended operational temperature range (-50C to 200C)
  • Sleep rentention mode (not shown)
  • Built-in regulation PMOS device
  • Independent    output  and  input  enable   /disable  (view note 1)
  • Selectable Schmitt Trigger Receiver
  • Selectable 60K ohm pull-up or pull-down resistor
  • ESD: 2kV HBM, 500V CDM (view note 2)

Block Diagram

Wirebond I/O Library in TSMC 130nm Block Diagram

Technical Specifications

Foundry, Node
TSMC 130nm
TSMC
Pre-Silicon: 65nm G
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Semiconductor IP