IBM, Chartered claim broad EDA support at 90 nm

(05/24/2004 5:00 PM EDT)

  EAST FISHKILL, N.Y. — IBM Corp. and Chartered Semiconductor Manufacturing Ltd. said Monday (May 24) that they have received support for their joint 90-nm manufacturing process from four leading EDA companies.

Nanometer-scale design libraries, EDA tools and standard foundry RTL-to-GDSII reference flows have been announced by Cadence Design Systems Inc., Magma Design Automation Inc., Mentor Graphics Corp. and Synopsys Inc.

"It is critical that we continue to develop and support a global technology platform that gives our customers access to the industry's most advanced 90-nm process and do it in a way that makes moving between our two foundries transparent.

As part of our collaboration with Chartered, customers get support from these key EDA suppliers simultaneously for both foundries, saving valuable time and providing enhanced sourcing options," said Tom Reeves, IBM's vice president, semiconductor products and solutions and the Systems & Technology Group.

"Our collaboration with IBM is focused on providing an unprecedented level of flexible access to leading-edge capacity from two of the world's leading manufacturers," said Kevin Meyer, vice president of worldwide marketing and services at Chartered.