Arm and Samsung Foundry are now collaborating on 7nm and beyond
May 24, 2018
Arm and Samsung Foundry, which have partnered for years on innovations in ultra-deep submicron process nodes, have announced a new milestone in their relationship: The first 7LPP (7nm Low Power Plus) and 5LPE (5nm Low Power Early) libraries for the long-anticipated extreme ultra-violet (EUV) lithography.
The announcement is the latest in a tremendously successful 12-year collaboration between Arm and Samsung Foundry, which has produced technologies and libraries starting at 65nm. Leveraging Arm’s unique IP integration capabilities, Samsung Foundry was able to use Arm physical and processor IP to validate the design readiness of their most advanced node.
To read the full article, click here
Related Semiconductor IP
- Root of Trust (RoT)
- Fixed Point Doppler Channel IP core
- Multi-protocol wireless plaform integrating Bluetooth Dual Mode, IEEE 802.15.4 (for Thread, Zigbee and Matter)
- Polyphase Video Scaler
- Compact, low-power, 8bit ADC on GF 22nm FDX
Related Blogs
- New Armv9 CPUs for Accelerating AI on Mobile and Beyond
- Cadence and Arm Are Building the Future of Infrastructure
- How Google and Arm Collaborate on the Next Wave of Cloud Infrastructure
- Samsung Foundry and Synopsys Accelerate Multi-Die System Design
Latest Blogs
- FiRa 3.0 Use Cases: Expanding the Future of UWB Technology
- Cadence Announces Industry's First Verification IP for Embedded USB2v2 (eUSB2v2)
- The Industry’s First USB4 Device IP Certification Will Speed Innovation and Edge AI Enablement
- Understanding Extended Metadata in CXL 3.1: What It Means for Your Systems
- 2025 Outlook with Mahesh Tirupattur of Analog Bits