Intel's 22nm Process. Atom, ARM, Apple
May 8, 2011
Intel had a big press event yesterday at which they announced details of their 22nm process. In a change from their current processes, it goes with a vertical gate. In fact 3 gates which gives them much better control of leakage through transistors that are switched off, along with more transmission through the on transistors. They claim to get 37% better performance and 50% power reduction compared to 32nm. Although vertical transistors have been talked about for nearly a decade, Intel's tri-gate is the first time anyone has brought them into volume production.
To read the full article, click here
Related Semiconductor IP
- Zigbee Transceiver PHY
- Data Flow Architecture IP
- AMBA SPI Controller MRAM Controller
- Ethernet MAC
- Protocol Bridges
Related Blogs
- 22nm Finfet May Extend Intel's Two Year Lead In Process
- Samsung 28nm Beats Intel 22nm!
- Intel Losing Control Of Process Technology
- ARM 1176 in IBM SOI process demonstrates a cell-based flow
Latest Blogs
- IDS-NoC: A Scalable Interconnect Solution for Modern SoC Design
- Leading-edge AI IC designs demand comprehensive HAV methodologies
- Beyond the Fab: Building Europe’s Next Generation of Semiconductor Champions
- AI Semiconductor Design at 3nm and 2nm: Silicon-Proven IP
- Samsung Foundry and Cadence Expand Infrastructure and Physical AI Solution