Samsung Readies Gate-All-Around Ramp
By Alan Patterson, EETimes (January 28, 2022)
Samsung Electronics said it’s on track in the second half of this year to launch the world’s first commercial production of chips based on its gate-all-around (GAA) process. The emerging process is likely to provide transistor density advantages over the current FinFET technology used at the 5-nm node, where Taiwan Semiconductor Manufacturing Co. (TSMC) rules the roost.
“We will complete the qualification of first-generation GAA process 3GAE for mass production in the first half of this year,” Moonsoo Kang, head of Samsung’s Foundry Market Strategy Team, said during a conference call to discuss quarterly results. “We will continue to develop the second-generation GAA process, 3GAP, as scheduled.”
The designations 3GAE and 3GAP are Samsung’s names for the first and second generations of the new GAA processes under development.
To read the full article, click here
Related Semiconductor IP
- Hybrid Memory Cube Verification IP
- nQrux® Root of Trust IP
- AXI to UCIe Bridge IP
- UCIe 2.x Controller IP
- SWI3S (SoundWire I3S Interface) Peripheral Controller Core IP
Related News
- Amphion readies hardware accelerator cores
- Virage Logic readies self-repairing embedded memory
- STMicro readies Bluetooth SoC, VLIW cores
- VSIA readies Web tool, system-level design specs
Latest News
- RaiderChip’s Edge NPU reaches more than 50 Generative AI Models with the addition of Qwen3.8-27B
- Aion Silicon Named Design Solution Associate in New Rapidus CORE Ecosystem for 2nm Semiconductors
- Arteris Wins Funding to Expand Hardware Design Supply Chain Security Assurance for the Trusted and Assured Microelectronics Program
- UMC Reports Sales for September 2026
- LUBIS EDA Launches FormalOS: Infrastructure for Systematic, Scalable Formal Verification