TSMC's R&D boss addresses 40-nm yields, high-k, litho
Mark LaPedus, EETimes
(02/24/2010 3:41 PM EST)
SAN JOSE, Calif. -- At the TSMC Japan Executive Forum in Yokohama this week, Shang-Yi Chiang, senior vice president of R&D at Taiwan Semiconductor Manufacturing Co. Ltd. (TSMC), addressed several issues about the silicon foundry giant. Chiang discussed TSMC's 40-nm capacity, yield issues, high-k and lithography. EE Times obtained a transcript of the presentation. Here's some of the issues discussed:
To read the full article, click here
Related Semiconductor IP
- Ultra Ethernet MAC & PCS 100G/200G/400G/800G
- Ethernet PCS 100G/200G/400G/800G/1.6T
- Ethernet MAC 100G/200G/400G/800G/1.6T
- Junction Over-Temperature Detector with Linear Centigrade-to-Voltage Output - X-FAB XT018
- Performance P570 Gen 3
Related News
- TSMC 2nm yields nearly ready for mass production
- TSMC shuns high-NA EUV lithography
- National to use SiidTech's Silicon Fingerprinting to boost chip yields
- Date yields testimonials and processor cores
Latest News
- SkyeChip Berhad Delivers 35.0% Net Profit Growth Ahead of Main Market Debut on 20 May 2026
- Quantum eMotion and JMEM TEK Sign Consortium Agreement to Accelerate Quantum-Resilient Semiconductor SoC Development
- Silvaco Announces Immediate Availability of Mixel MIPI C-PHY/D-PHY Combo IP on TSMC N2P Process
- BrainChip Strikes IP Licensing Deal with ASICLAND
- Arteris Technology Adopted by Li Auto for Intelligent Vehicles