TSMC's R&D boss addresses 40-nm yields, high-k, litho
Mark LaPedus, EETimes
(02/24/2010 3:41 PM EST)
SAN JOSE, Calif. -- At the TSMC Japan Executive Forum in Yokohama this week, Shang-Yi Chiang, senior vice president of R&D at Taiwan Semiconductor Manufacturing Co. Ltd. (TSMC), addressed several issues about the silicon foundry giant. Chiang discussed TSMC's 40-nm capacity, yield issues, high-k and lithography. EE Times obtained a transcript of the presentation. Here's some of the issues discussed:
To read the full article, click here
Related Semiconductor IP
- Mesochronous Bridge for PCIe/CXL
- AI-native GPU
- OpenGMSL Verification IP
- OpenGMSL Leaf IP
- FlexGen Multi-Die Smart Network-on-Chip (NoC) IP
Related News
- TSMC 2nm yields nearly ready for mass production
- TSMC shuns high-NA EUV lithography
- National to use SiidTech's Silicon Fingerprinting to boost chip yields
- Date yields testimonials and processor cores
Latest News
- SignatureIP Unveils MesoLink, a Mesochronous Bridge for PCIe/CXL Validation
- ICTK Partners with Jiran Security to Drive Post-Quantum Cryptography (PQC) Migration
- S2C Named Andes Technology’s 2026 Partner of the Year
- BrainChip Launches AKD1500 PCIe Card For Edge AI Evaluation Everywhere
- TDK-Micronas adopts Aniah’s AI-powered OneCheck® platform to advance automotive semiconductor development