Intel to Spend $5 Billion on 10nm Fab in Israel
Nitin Dahad, EETimes
5/24/2018 00:01 AM EDT
LONDON — Intel Corporation plans to invest $5 billion over the next two years to upgrade its fab in Kiryat Gat in Israel from 22nm to 10nm technology.
There was no official announcement from Intel, but Israel’s ministry of finance said in a statement that approval is expected from Israel’s government bodies in weeks and that the new plant will employ an additional 250 people. Intel had apparently considered several possible expansion sites but, after two years of discussion with Israel’s finance ministry, decided to expand its site in the country.
To read the full article, click here
Related Semiconductor IP
- UCIe D2D Adapter & PHY Integrated IP
- Low Dropout (LDO) Regulator
- 16-Bit xSPI PSRAM PHY
- MIPI CSI-2 CSE2 Security Module
- ASIL B Compliant MIPI CSI-2 CSE2 Security Module
Related News
- Intel German fab in doubt
- Intel considers foundry split, fab cancellations
- Intel to Repurchase 49% Equity Interest in Ireland Fab Joint Venture
- TSMC to Start 10nm in 2017, Closing Gap with Intel
Latest News
- Arasan acheives the Industry's First ASIL-D Certification for its CAN XL IP Core
- Quintauris and Elektrobit Partner to Enable Reliable RISC-V Solutions for Automotive
- Wind River Joins the CHERI Alliance and Collaborates with Innovate UK to Accelerate Cybersecurity Innovation
- Arteris and MIPS Partner to Accelerate Development for Physical AI Platforms
- DCD-SEMI expands CryptOne with EdDSA Curve25519 IP core for secure embedded systems