6 track High Density standard cell library at TSMC 180 nm

Overview

Foundry Sponsored, TSMC 180 eLL, SESAME HD DV provides the best trade-off between area and power achieved from an innovative cell design enabling 6-track cells and 1P3M SoC implementation.

Key Features

  • Less Silicon
  • High Density optimization
  • 6-Track high cells for optimal area reduction
  • Only Metal 1 used for cell design
  • Compatible with 1P3M SoC implementation
  • Power reduction features
  • Compatible with the Islet Construction Kit for a smooth construction and integration of multi voltages, extinction, and retention islets
  • 40% less leaky by design

Technical Specifications

Maturity
In_Production
TSMC
In Production: 180nm ELL
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Semiconductor IP